The transistor channel
allows current to flow from the source to the drain,
representing a binary "1" in digital
computing. When current is not flowing, the transistor
is read as a "0". A shorter channel length means
a higher operating speed as well as more transistors
that can be packed
on a given chip and a higher operating profit. According to the
technology road map of the Semiconductor Industry Association
(SIA), the ability to shrink the channel will hit physical limits
sometime before the year 2020. At that point, new
revolutionized chip design architectures or materials are
needed. Early
this year, Fujitsu announced that in 2010, the company could
begin using carbon nanotubes to replace some of the copper
interconnections in their chips made on the 45-nanometer
process. Dr. Yuji Awano, a research fellow at Fujitsu Laboratories' Nanotechnology Research Center,
explained that in theory, carbon nanotubes can have an
electrical current density about 1,000 times higher than
that in copper and hence the carbon nanotube
interconnection can be made smaller than that made with copper. In addition,
electrons can flow through carbon nanotubes about 10
times faster than that in copper and dissipate heat much
more readily. Dr. Yukinori Ochiai, principal
researcher at Toyko,
Japan-based NEC's nanotechology group, has been
developing a new type of CNT-based Field-Effect
Transistor (CNTFET) having an aluminum gate electrode
and titanium dioxide gate insulator. According to Ochiai,
such a CNTFET can amplify about 20 times more current than conventional
metal oxide silicon-based transistors (MOSFET) with low
leakage between the gate and other parts of the transistor.
The next step is to make this CNTFET in a group of 10
and then hundreds, explained Dr. Ochiai. For
reference, the latest Intel 64-bit microprocessor,
Itanium-2, has 1.72 billion transistors on a single
chip. Our analysis shows that more billion transistor
chips like NAND flash memory could enter the chip market
in the second half of next year.
Commercially
Viable Products Still a Decade Away. Santa Clara, CA-based chip giant, Intel
Corporation (NASDAQ: INTC), is sticking with the silicon
complementary metal oxide semiconductor (CMOS) infrastructure for the next 10 years at least, but
is planning the future of processors
with nanotechnology. As the physical channel length
shrinks to 15 nm and the gate oxide to a thickness of
less than 1 nm early next decade, Intel may be forced to
deploy a nonplanar-type CMOS structures, such as tri-gate
transistors, where the gate material surrounds the transistor on three
sides. Intel is
also investing in start-up companies such as privately held Palo Alto, CA
based-Nanosys
Inc through Intel Capital, the strategic investment group at
Intel Corp. The corroboration includes an exploration of
next-generation materials such as nanowires in non-volatile
memory technology
applications. Nanosys was recently issued a U.S. Patent
No. 6,882,051 entitled "Nanowires, nanostructures and
devices fabricated therefrom," by the U.S. Patent and
Trademark Office. Considering
other risk factors including development costs of design,
manufacturing and inspection tools, manufacturing process costs and
yields as well as the stability of chip pricing, it could be
at least another decade until nanotubes and nanowires are materials that come into use in
the mass production
of nanoelectronic devices.
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